TED 476033-2026 Clustertool for Ion Beam Etching of 300mm wafers

The tender item is an ion beam etching process tool to be used for 300mm wafer fabrication at the FRAUNHOFER IPMS. The systems will be used for the processing of CMOS wafers in a cleanroom class 1000 (approximately class 6 EN ISO 14644-1) production environment. Therefore, it is necessary to fulfill require-ments regarding metal contamination and particle generation compatible with industry standards.

Publikationsnummer: 476033-2026 Veröffentlicht: 2026-07-10 Auftraggeber: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V., Erlangen Geschätzter Wert: 1.0 EUR

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Zusätzliche Informationen

Feld Wert
Zuletzt aktualisiert August 15, 2026, 17:43 (UTC)
Erstellt August 15, 2026, 17:43 (UTC)
buyer_city Erlangen
buyer_country DEU
buyer_name Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
contract_type goods
cpv_codes 42900000
cpv_main 42900000
document_type can-standard
estimated_value 1.0
estimated_value_currency EUR
language DEU
notice_title Clustertool for Ion Beam Etching of 300mm wafers
notice_version 2
nuts DE252
procedure_id bd4dfee5-1838-40b4-a81a-06d8f79ef81c
procedure_type neg-w-call
publication_date 2026-07-10
publication_number 476033-2026