TED 498425-2026 System for High Apect Ratio Etch consisting of mainframe and process chambers (IPMS-CNT05.1) - PR1153448-2480-P

System for High Apect Ratio Etch consisting of mainframe and process chambers (IPMS-CNT05.1)

Publikationsnummer: 498425-2026 Veröffentlicht: 2026-07-20 Auftraggeber: Fraunhofer-Gesellschaft - Einkauf B12, München

Daten und Ressourcen

Zusätzliche Informationen

Feld Wert
Zuletzt aktualisiert August 16, 2026, 04:52 (UTC)
Erstellt August 16, 2026, 04:52 (UTC)
buyer_city München
buyer_country DEU
buyer_name Fraunhofer-Gesellschaft - Einkauf B12
changed_notice_id e136cb0f-1988-4bde-aada-4ab40d6d273b-01
contract_type goods
cpv_codes 42990000
cpv_main 42990000
document_type cn-standard
language DEU
notice_title System for High Apect Ratio Etch consisting of mainframe and process chambers (IPMS-CNT05.1) - PR1153448-2480-P
notice_version 1
nuts DE212
procedure_id 39ae1f38-6e14-4ef8-8536-cbcf238647a9
procedure_type neg-w-call
publication_date 2026-07-20
publication_number 498425-2026